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Physics Internship: Straylight Prediction Model Development
1 maand geleden
ASML is a leading innovator in the semiconductor industry, providing cutting-edge hardware to chipmakers. We are seeking a master's student in physics or optics to join our System Performance DUV department as an intern.
Background InformationOur company is at the forefront of lithographic patterning, with a focus on precision and accuracy. The System Performance DUV department is responsible for predicting and optimizing scanner performance in various environments. As an intern, you will work closely with our team to develop a model that predicts scanner performance from various contributors, including straylight.
Your AssignmentYour primary responsibility will be to create a better understanding of the physical background of straylight and improve our current model. You will also gain insight into the Point Spread Function (PSF) and test the conversion of physical data to the PSF model.
Your ProfileTo be a successful candidate, you should have a master's degree in physics or optics, a strong affinity for physics concepts related to imaging, and excellent programming skills in languages such as MATLAB or Python. You should also be a detail-oriented, critical thinker who can work independently and as part of a dynamic team.
RequirementsThis is a non-thesis related assignment, lasting for a minimum of 6 months, starting in September 2024. You will work a minimum of 32 hours per week, with a maximum of 40 hours. You must be enrolled at a higher education institution for the entire duration of the internship and be located in the Netherlands to perform your internship.
About ASMLASML is a global industry leader, headquartered in the Netherlands. We manufacture complex lithography machines that chipmakers use to produce integrated circuits. Our company is at the heart of all electronic devices that keep us informed, entertained, and connected. We believe in the power of innovation and the importance of diversity and inclusion in our workforce.
