Physics Internship: Development of Mirror Metrology for EUV Projection Optics

4 weken geleden


Veldhoven, Noord-Brabant, Nederland ASML Voltijd

Introduction

ASML is seeking a master's student in Physics or Optics to develop a mirror metrology system for EUV projection optics. The successful candidate will work closely with the EUV Projection Group to design, integrate, and qualify the optical performance of the projection modules in the EUV scanners.

Background Information

The Optical Column (OC) is the heart of the EUV lithography systems, responsible for collecting EUV light from the source and projecting the photomask image onto the wafer. The EUV Projection Group is responsible for the transfer and de-magnification of the reticle image onto the wafer in the EUV scanners.

Your Assignment

The goal of this project is to develop a mirror metrology system that can determine the failure mechanism in case of optical performance degradation. The successful candidate will simulate sensor measurements, develop a failure mode detection algorithm, and apply it to machine data.

Your Profile

To be a match for this internship, you should have a master's degree in Physics or Optics, be skilled in Python and/or MATLAB, and have analytical thinking and good communication skills in English.

This is an internship for 5 days a week with a duration of 6 to 9 months. The start date is as soon as possible.

About ASML

ASML is a high-tech company headquartered in the Netherlands, manufacturing complex lithography machines for chipmakers. We believe in the importance of diversity and inclusion in the workplace and are an Equal Opportunity Employer.



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