Postdoctoral Researcher: Plasma Surface Interactions
3 weken geleden
We are seeking a highly motivated Postdoctoral Researcher to join our team at ARCNL, focusing on plasma surface interactions and thin films. The successful candidate will have a strong background in surface science and/or plasma-surface interactions, and will be responsible for performing in situ studies of the evolution of surface and interface chemistry of materials exposed to radicals, ions, and full plasma.
Key Responsibilities- Perform in situ studies of plasma-induced changes to surfaces, interfaces, and thin films using surface-sensitive techniques.
- Operate ultra-high vacuum tools for the preparation of surfaces and thin films, vacuum-based transfer to plasma exposure setups, and surface-sensitive in situ spectroscopy.
- Contribute to the development of new surface-sensitive techniques and methods for studying plasma-surface interactions.
- Collaborate with other researchers at ARCNL to advance our understanding of plasma surface interactions and their applications.
- PhD in Physics, Physical Chemistry, or a related field.
- Experience in surface science and/or plasma-surface interactions.
- Strong background in surface-sensitive techniques, such as photoelectron spectroscopy and scanning probe microscopy.
- Excellent communication and teamwork skills.
ARCNL offers a dynamic and collaborative research environment, with access to state-of-the-art facilities and equipment. The successful candidate will have the opportunity to work with a diverse team of researchers and contribute to the development of new surface-sensitive techniques and methods.
How to ApplyInterested candidates should submit their application, including a CV, cover letter, and contact information for at least two references, to r.bliem@arcnl.nl.
About ARCNLARCNL is a research institute located at Amsterdam Science Park, focusing on the physics and chemistry involved in current and future key technologies in nanolithography. Our research program is geared towards establishing scientific excellence, while also addressing the needs of our industrial partner ASML.
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