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Senior Physics Design Engineer

4 maanden geleden


Veldhoven, Noord-Brabant, Nederland ASML Voltijd
Introduction to the job

Does contributing to the world’s most advanced lithography machines make you feel responsible and proud? Are you an ambitious design engineer who is fascinated by lithography? Do you want to work in a challenging environment in the center of different groups in D&E and SE and in close collaboration with the customer? Do you want to use your technical and leadership skills to bring a multidisciplinary team together? Then the role of Customer Imaging Sr. Design Engineer is just for you

Within the D&E EUV System Performance department, we have recently formed a customer imaging team. In this team we drive the lithography solution roadmap in close collaboration with System Engineering Imaging. For this purpose, we manage a technology study program with external partners as IMEC, Fraunhofer and take part in customer collaborations.

You will be one of our senior experts in this team, strengthening the team with your deep technological expertise in the field of lithography. You have strong leadership skills to shape the environment around you.

Role and Responsibilities

The semiconductor industry is governed by Moore’s Law. Our customers demand machines and tooling capable to image future node functionality, including among others pattern shrink and increasing pattern complexity at the backdrop of increasing productivity and HVM capabilities. It is our task, in close collaboration with System Engineer Imaging, Node SDS team and TDC, to understand these future requirements of our customer, and explore technology solutions enabling the lithographic requirements. The studies entail all aspects of lithography, and encompass next to our scanners, reticle and resist technologies, SMO, OPC among others.

In this field, you as a customer imaging sr. design engineer take the lead in this team on specific topics, and you take ownership of a customer interaction being the first point of contact. As imaging design engineer your responsibilities are to:

  • Support customer node transition with dedicated imaging prediction and verification by experiments
  • Perform path finding imaging analysis to support customer roadmaps
  • Communicate with a wide range of stakeholders such as (system) engineers of various scanner components, marketing, suppliers (e.g. Zeiss), external partners (e.g. IMEC) and customers
  • Share results in clear documents and presentations
  • Develop junior engineers

This may involve:

  • Limited travel to customers and partners (8 years of experience in R&D or other high-tech environment)
  • Strong network within the ASML imaging community
  • Deep knowledge of and experience with lithography, lithographic imaging and simulations (HyperLith, ProLith etc), and ASML scanners
  • Experience with customer project, including knowledge of the semiconductor industry
  • Strong programming skills (Python and/or MatLab, etc)

Personal Skills:

Working at the cutting edge of tech, you’ll always have new challenges and new problems to solve – and working together is the only way to do that. You won’t work in a silo. Instead, you’ll be part of a creative, dynamic work environment where you’ll collaborate with supportive colleagues. There is always space for creative and unique points of view. You’ll have the flexibility and trust to choose how best to tackle tasks and solve problems. To thrive in this job, you’ll need the following Skills:

  • Technical leader with proven leadership skills and clear vision
  • Ability to extract valuable information, even from incomplete data, and formulate conclusions and follow-up
  • Ability to summarize and present complex topics in an understandable fashion to different stakeholders
  • Both team player and an independent researcher, able to steer and coach less experienced engineers
  • Self-propelling with a lot of initiative and drive. Able to initiate, influence, steer.

Context of the position

The System Performance EUV department is part of Performance & Integration cluster in D&E. We predict and optimize how our scanners will perform in their natural habitat: our customer’s wafer fab. We perform this task for EUV scanners.

Other information

Imaging competence will allow you to learn the basic principles of our lithographic system, to be in the heart of its development, understand contribution of various system components (aberrations, focus, dose, illumination, dynamics etc.) on the basic imaging functionality, collaborate with various functional clusters as well as our supporting competencies (resist, reticle, wafer metrology).

This position may require access to controlled technology, as defined in the Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.

This position requires access to controlled technology, as defined in the Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.

Diversity and inclusion

ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that Diversity and inclusion is a driving force in the success of our company.

Need to know more about applying for a job at ASML? Read our frequently asked questions.

Work Experience: 10-15 years

Travel: No

Education Level: Master,PhD

Employment Type: FULL_TIME

Team: Design Engineering and Architecture

Technical Field: Lithography System Performance