PhD Position in Hydrodynamics of Droplet-Laser Interaction for EUV Lithography
4 dagen geleden
We are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in the Netherlands. The successful candidate will work on a fully funded PhD project titled "Hydrodynamics of droplet-laser interaction for EUV lithography" as part of the Consolidator Grant "Next-Generation Light Source: Driving plasmas to power tomorrow's nanolithography (MOORELIGHT)".
Research ActivitiesThe research activities of the EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography. The goal of the project is to deliver the missing insight into the complex physics of EUV-emitting laser-produced plasmas generated from tin targets carefully shaped by a series of laser "pre-pulses".
Responsibilities- Design and execute experiments to understand the fluid dynamic fragmentation and vaporization of laser-impacted thin liquid tin targets.
- Collaborate with the in-house theory group to develop a thorough understanding of the underlying target dynamics.
- Apply and develop data analysis skills using a wide range of existing (image) data analysis tools.
- Cooperate within a large team of PhD students and postdocs and with a large industrial partner.
We are looking for a candidate with a MSc in physics or applied physics. Knowledge about fluid mechanics and/or experimental laser physics is advantageous. Programming skills (Python) are welcomed. Good verbal and written communication skills (in English) are required.
Working ConditionsThe position is intended as full-time (40 hours/week, 12 months/year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years. The starting salary is gross € 2,781 per month, and a range of employment benefits are offered. After successful completion of the PhD research, a PhD degree will be granted at a Dutch University.
More InformationFor further information about the position, please contact Dr. Oscar Versolato, Group leader EUV Plasma Processes, at or .
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) to investigate the dynamics of droplet-laser interactions in extreme ultraviolet (EUV) lithography. The successful candidate will work in a multidisciplinary team to develop a fundamental understanding of the...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdProject OverviewThe Advanced Research Center for Nanolithography (ARCNL) is seeking a highly motivated PhD candidate to join the EUV Plasma Processes group. The successful candidate will work on the hydrodynamics of droplet-laser interaction for EUV lithography, a critical aspect of next-generation light sources.Research ObjectivesThe PhD project aims to...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdProject OverviewThe Advanced Research Center for Nanolithography (ARCNL) is seeking a highly motivated PhD candidate to join our EUV Plasma Processes group. The successful candidate will work on the hydrodynamics of droplet-laser interaction for EUV lithography, a critical aspect of next-generation light sources.Research ObjectivesThe PhD project will focus...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in the Netherlands. The successful candidate will work on a fully funded PhD project titled "Hydrodynamics of droplet-laser interaction for EUV lithography" as part of the Consolidator Grant "Next-Generation Light...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in the Netherlands. The successful candidate will be part of a fully funded PhD position in the EUV Plasma Processes group, working on the fundamental physics and chemistry involved in current and future key...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in Amsterdam, The Netherlands. The successful candidate will work on a fully funded PhD project titled "Hydrodynamics of droplet-laser interaction for EUV lithography" as part of the Consolidator Grant "Next-Generation...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in the Netherlands. The successful candidate will work on a fully funded PhD project titled "Hydrodynamics of droplet-laser interaction for EUV lithography" as part of the Consolidator Grant "Next-Generation Light...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in the Netherlands. The successful candidate will be part of an interdisciplinary team working on the fundamental physics and chemistry involved in current and future key technologies in nanolithography.Research...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in Amsterdam, The Netherlands. The successful candidate will work on a fully funded PhD project titled "Imaging Spectroscopy for Broadband EUV Source Size Characterization" as part of a Holland High Tech (TKI HTSM)...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at ARCNL to work on a fully funded PhD project titled "Imaging Spectroscopy for Broadband EUV Source Size Characterization". This project is part of a Holland High Tech (TKI HTSM) grant and is a collaboration between ARCNL and the University of Twente (UT).Project OverviewThe...
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