Group Leader Positions in Nanolithography Research

2 maanden geleden

Amsterdam, Noord-Holland, Nederland Vrije Universiteit Amsterdam Voltijd

Position Overview
The Department of Physics and Astronomy at Vrije Universiteit Amsterdam, in collaboration with ARCNL and the Institute of Physics (IoP) of the University of Amsterdam, is inviting applications for three group leader positions. Candidates may focus on either experimental or theoretical modelling.

Your Role

In partnership with the Advanced Research Center for Nanolithography (ARCNL), we are launching a new round of our esteemed MacGillavry Fellowship and Lovelace Fellowship programmes. We are particularly encouraging female researchers who align with the ARCNL research agenda and aspire to leadership roles as (assistant/associate/full) professors at either university to consider applying.

For comprehensive details, please refer to the respective webpages of the MacGillavry Fellowship and Lovelace Fellowship programmes.

ARCNL represents a unique collaboration between Dutch universities and ASML, a leading private sector partner. As a national research center under the Dutch Research Council (NWO), ARCNL specializes in fundamental physics and chemistry related to (nano)lithography technologies, primarily serving the semiconductor industry. The center comprises three departments: Materials, (EUV) Source, and Metrology, employing around 100 staff members.

We are looking for three group leaders, each with a focus on either experimental research or theoretical modelling. You will engage in collaborative research with other groups within ARCNL. As a group leader, you will be appointed by either the University of Amsterdam or Vrije Universiteit Amsterdam at the assistant or associate professor level, depending on your qualifications. For exceptionally qualified candidates, a full professorship may be considered. The role at ARCNL includes a reduced teaching load compared to typical university staff.

ARCNL is driven by the challenges posed by ASML, which include generating 13.5 nm (or shorter wavelength) radiation from laser-produced plasmas, developing advanced metrology techniques, and conducting material research on coatings and interfaces focusing on mechanical wear and surface reactivity. Your research will support the advancement of cutting-edge methods for high-volume production of processor and memory chips.

We value diverse expertise and welcome candidates who can contribute to our research goals. The ideal candidate is an energetic and productive researcher who thrives on collaboration, yielding impactful scientific results and innovative proof-of-concept outcomes for ASML.

Your group will have access to all ARCNL facilities, with potential resources available at ASML. Local and national computational resources are located at the Amsterdam Science Park. Collaboration with the physics, chemistry, and materials departments at the University of Amsterdam, Vrije Universiteit Amsterdam, or the Zernike Institute for Advanced Materials in Groningen is encouraged.

Qualifications
We invite applications from candidates who possess the following qualifications:

  • PhD in physics, chemistry, or materials science;
  • Demonstrated experience and a strong scientific record in atomic, molecular, plasma, or instrumental physics;
  • Willingness to teach at the university level with proven teaching abilities;
  • Experience in supervising BSc, MSc, and/or PhD students is preferred;
  • Ability to secure external funding;
  • Excellent communication and interpersonal skills;
  • Proficiency in English and a willingness to learn Dutch;
  • Experience with collaborations between industry and academia is advantageous.
What We Offer

Start dates are flexible. Positions will be filled at the Assistant or Associate Professor level, depending on qualifications. For exceptionally experienced candidates, a Full Professor appointment may be considered.

The starting salary will align with university regulations for academic personnel and will depend on experience and qualifications. It ranges from a minimum gross monthly salary to a maximum gross monthly salary, excluding holiday and end-of-year bonuses. A favorable tax agreement may apply to non-Dutch applicants.

About ARCNL

ARCNL focuses on the fundamental physics and chemistry involved in key technologies for nanolithography, primarily for the semiconductor industry. It is a public-private partnership involving the Dutch Research Council (NWO), the University of Amsterdam, Vrije Universiteit Amsterdam, the University of Groningen, and ASML, comprising approximately 100 scientists and support staff.

Application Process

Interested candidates should submit their applications through the designated application form. Required documents include:

  • A motivation letter explaining your interest in the unique role of ARCNL as a bridge between academic research and industrial technology;
  • A research statement (maximum 6 pages);
  • A resume;
  • A list of publications;
  • Contact details for three references.

All requested documents must be provided. A knowledge security check may be part of the selection process.

Diversity Commitment
ARCNL is dedicated to fostering an inclusive and diverse work environment, encouraging applicants from various backgrounds and cultures. We recruit based on competencies and talents, welcoming all qualified individuals to apply.

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