Physics Internship: Development of Mirror Metrology for EUV Projection Optics

7 uur geleden


Veldhoven, Noord-Brabant, Nederland ASML Voltijd
Introduction

ASML is seeking a highly motivated Master student in Physics or Optics to join our team as an intern in the EUV Projection Group. As an intern, you will have the opportunity to work on a challenging project that involves developing mirror metrology for EUV projection optics.

Background Information

The Optical Column (OC) is the heart of the EUV lithography systems, responsible for collecting EUV light from the source and projecting the photomask image onto the wafer. The EUV Projection Group is responsible for the design, integration, qualification, and troubleshooting of the optical performance in the projection modules in the EUV scanners.

Your Assignment

The goal of this project is to develop mirror metrology that can determine the failure mechanism in case of degradation. This involves simulating sensor measurements by optics degradation, developing a failure mode detection algorithm, and studying its performance. You will also apply the algorithm on machine data and discuss the results with the Optics Lifetime team.

Your Profile

To be a match for this internship, you should have a Master's degree in Physics or Optics, be skilled in tooling like Python and/or MATLAB, have analytical thinking and be motivated to learn, and have good communication skills in English.

What We Offer

As an intern at ASML, you will gain valuable experience in a highly innovative environment, work in a dynamic team, and have the opportunity to contribute to the development of cutting-edge technology. You will also receive a monthly internship allowance of maximum €600, plus a possible housing or travel allowance.

About ASML

ASML is a high-tech company headquartered in the Netherlands, manufacturing complex lithography machines that chipmakers use to produce integrated circuits. We believe in the importance of diversity and inclusion and are an Equal Opportunity Employer.



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