PhD Position: Unveiling Droplet-Laser Dynamics for EUV Lithography
20 uur geleden
Company Overview
The Advanced Research Center for Nanolithography (ARCNL) is a pioneering institution at the forefront of nanolithography research. Our mission is to advance the fundamental understanding of the physics and chemistry involved in current and future key technologies, primarily for the semiconductor industry.
We are a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (UG), and the semiconductor equipment manufacturer ASML.
Salary
The PhD position offers a full-time appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) with a starting salary of gross € 2,781 per month.
Job Description
This fully funded PhD position lies at the interface between fundamental physics and industrial application, aiming to deliver the missing insight into the complex physics of droplet-laser interaction for EUV lithography.
You will join an interdisciplinary team of several PhD students and postdocs, responsible for designing & executing experiments to understand the fluid dynamic fragmentation and vaporization of laser-impacted thin liquid tin targets.
The goal is to develop a thorough understanding of the underlying target dynamics, allowing for optimal coupling to laser light and producing hot-and-dense plasma.
Required Skills and Qualifications
- A MSc in Physics or Applied Physics
- Knowledge about fluid mechanics and/or experimental laser physics is advantageous
- Programming skills (Python) are welcomed
- Good verbal and written communication skills in English
Benefits
- Responsibility over a setup including state-of-the-art droplet generators and laser system
- The ability to improve your experimental skills in extensive experimental campaigns
- Collaboration with the in-house theory group, allowing you to develop a thorough understanding of the underlying target dynamics
- A wide range of existing data analysis tools, allowing you to apply and develop your data analysis skills
- Cooperation within a large team of PhD students and postdocs and with a large industrial partner
Working Conditions
The position is intended as a full-time appointment in the service of NWO-I for the duration of four years, with a favorable tax agreement for non-Dutch applicants.
ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdResearch OpportunityThe Advanced Research Center for Nanolithography (ARCNL) is seeking a highly motivated PhD candidate to join the EUV Plasma Processes group. The successful candidate will be part of an interdisciplinary team working on the fundamental physics and chemistry involved in current and future key technologies in nanolithography.The project...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in the Netherlands. The successful candidate will work on a fully funded PhD project titled "Hydrodynamics of droplet-laser interaction for EUV lithography" as part of the Consolidator Grant "Next-Generation Light...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdProject OverviewThe Advanced Research Center for Nanolithography (ARCNL) is seeking a highly motivated PhD candidate to join the EUV Plasma Processes group. The successful candidate will work on the hydrodynamics of droplet-laser interaction for EUV lithography, a critical aspect of next-generation light sources.The project aims to deliver a fundamental...
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdJob DescriptionWe are seeking a highly motivated PhD researcher to join our team at the Advanced Research Center for Nanolithography (ARCNL) in the Netherlands. The successful candidate will work on a fully funded PhD project titled "Hydrodynamics of droplet-laser interaction for EUV lithography" as part of the Consolidator Grant "Next-Generation Light...
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