PhD Position in Hydrodynamics of Droplet-Laser Interaction for EUV Lithography
4 weken geleden
The Advanced Research Center for Nanolithography (ARCNL) is seeking a highly motivated PhD candidate to join the EUV Plasma Processes group. The successful candidate will work on the hydrodynamics of droplet-laser interaction for EUV lithography, a critical aspect of next-generation light sources.
The project aims to deliver a fundamental understanding of the complex physics involved in the interaction of high-energy CO2-gas laser pulses with molten tin microdroplets. This knowledge will enable the development of more efficient solid-state lasers for EUV lithography, leading to improved efficiency and output power.
Research ObjectivesThe PhD candidate will design and execute experiments to understand the fluid dynamic fragmentation and vaporization of laser-impacted thin liquid tin targets. This will involve collaboration with the in-house theory group and the development of new experimental skills in extensive experimental campaigns.
The successful candidate will be responsible for the setup, execution, analysis, and interpretation of the experiments, as well as the development of new data analysis tools. The PhD candidate will also have the opportunity to collaborate with a large team of PhD students and postdocs, as well as with a large industrial partner.
QualificationsThe ideal candidate will have a MSc in physics or applied physics, with knowledge of fluid mechanics and/or experimental laser physics being advantageous. Programming skills in Python are welcomed, and good verbal and written communication skills in English are required.
Working ConditionsThe position is a full-time appointment for four years, with a starting salary of gross € 2,781 per month and a range of employment benefits. The PhD candidate will be granted a PhD degree at a Dutch University after successful completion of the research. ARCNL offers a favorable tax agreement, the '30% ruling', to non-Dutch applicants, as well as assistance with housing and visa applications and compensation for transport costs and furnishing expenses.
ApplicationInterested candidates should submit their resume and a motivation letter on why they want to join the group (max. 1 page). Applications will be evaluated on a rolling basis, and the position will be filled as soon as an excellent match is made. Online screening may be part of the selection process.
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PhD Researcher in Droplet-Laser Interaction for EUV Lithography
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Amsterdam, Noord-Holland, Nederland ARCNL VoltijdAbout the Project:The Advanced Research Center for Nanolithography (ARCNL) is seeking a highly skilled researcher to join its EUV Plasma Processes group. The successful candidate will work on a project focused on the hydrodynamics of droplet-laser interaction for EUV lithography. This project aims to deliver a deeper understanding of the underlying physics,...
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