Researcher: Laser-Tailored Droplet Dynamics for EUV Lithography

2 weken geleden


Amsterdam, Noord-Holland, Nederland ARCNL Voltijd
Company Overview

The Advanced Research Center for Nanolithography (ARCNL) is a public-private partnership focused on fundamental physics and chemistry involved in current and future key technologies in nanolithography. We aim to deliver atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light.

Salary and Benefits

This PhD position comes with a starting salary of gross € 2781 per month, including a range of employment benefits. After successful completion of the research, a PhD degree will be granted at a Dutch University.

Job Description

We are seeking an interdisciplinary researcher to design and execute experiments understanding fluid dynamic fragmentation and vaporization of laser-impacted thin liquid tin targets. The goal is to develop new capabilities for laser-tailing targets, optimizing coupling to laser light for producing hot-and-dense plasma.

You will join an interdisciplinary team, responsible for setup, execution, analysis, and interpretation of experiments. Collaboration with fluid dynamics computationalists and theorists is expected, as well as close work with a large industrial partner.

Required Skills and Qualifications

To succeed in this role, you have or soon will have a MSc in physics or applied physics. Knowledge about fluid mechanics and/or experimental laser physics is advantageous. Programming skills in Python are welcomed, and good verbal and written communication skills in English are required.

Working Conditions

This is a full-time appointment for four years, with a favorable tax agreement ('30% ruling') available for non-Dutch applicants. ARCNL assists foreign PhD students with housing, visa applications, and compensates transport costs and furnishing expenses.

MORE INFORMATION

Contact Dr. Oscar Versolato, Group leader EUV Plasma Processes, for further information about the position.



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