PhD Position in EUV Source Size Characterization and Imaging Spectroscopy
1 dag geleden
We are seeking a highly motivated PhD candidate to join our research team at ARCNL, where you will contribute to the development of novel imaging spectroscopy techniques for diagnosing plasma sources of extreme ultraviolet (EUV) light.
Job DescriptionThis fully funded PhD position is part of a collaborative project between ARCNL and University of Twente (UT), focused on further developing and employing novel imaging spectroscopy capabilities to diagnose plasma. You will be responsible for developing new techniques and employing them to understand and optimize promising alternative laser-produced plasma sources of EUV light.
Your main objective will be to develop a compact imaging spectroscopy tool based on a combination of nanofabricated grating and dispersion-matched zone plate, and use this tool to unravel the radiative power partitioning over the various relevant wavelength bands and their spatial origins.
Qualifications and RequirementsTo be eligible for this role, you should have a MSc in Physics or Applied Physics. Programming skills in Python are welcomed, as well as good verbal and written communication skills in English.
What We OfferThe position comes with a salary of approximately € 34,000 per annum, which includes a range of employment benefits. You will also have access to state-of-the-art cleanroom facilities at UT and dedicated setup, laser systems, and plasma diagnostic tools at ARCNL.
About ARCNLARCNL is a public-private partnership between NWO, UvA, VU, UG, and ASML, focusing on the fundamental physics and chemistry involved in current and future key technologies in nanolithography. Our research activities aim to understand the atomic- and molecular-level dynamics in the operation of contemporary and future plasma-based sources of EUV light for nanolithography.
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